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Contact Us GLOBAL Search this site 日本語 中文 Corporate Overview Products and Services Research and Development Sustainability News Corporate Overview Message from the Management Philosophy Quick Guide to JX Advanced Metals Business Segments Corporate Data Organization and Executive Officers Corporate History Operating Sites and Group Companies Long-Term Vision and Medium- to Long-term Business Strategies and Business Targets Purchasing Information Products and Services Search by Category Copper Alloys and Special Steel Products Copper Foil Sputtering Targets Compound Semiconductors and Crystal Materials Metal and Compound Powders Special Ceramic Powders High Purity Metals Surface Treatment Agents Upinorg (high-purity copper sulfate) Electroless UBM Plating Service MoSi2 Heater Shielding Materials Nonferrous Metals and Chemical Products Products Under Development Search by Keyword Semiconductors and Sensors Circuit Boards Assembly Displays Batteries and Energy Additive Manufacturing Connectors Magnetic Devices Electromagnetic Shielding Communications Optics Camera Modules Piezoelectricity Thermal Control Research and Development Our Core Technologies Contributing to Societal Growth and Innovation Initiatives for Co-creation Collaboration in the Group SQUARE LAB Sustainability Sustainability Report Toward Net-Zero CO2 Emissions Activities in Environmental Conservation CSR Purchasing News News Release Trade Fairs and Exhibitions MENU HOME News News Release FY2023 Announcement of Organizational Changes News Release FY2023 January 26, 2024 JX Metals Corporation Announcement of Organizational Changes JX Metals Corporation (President: Hayashi Yoichi; "the Company") will establish a CVD･ALD Material Business Promotion Office in the Advanced Technology & Strategy Department, Technology Group, effective February 1, 2024, aiming to achieve forward-looking business development in a new business area. 　 The market for materials used in the semiconductor devices-manufacturing process is expected to see continued growth. The Company's sputtering targets for semiconductors, which represent one of its core products, have secured the world's largest share of the market thanks to high appraisals across the industry for their effectiveness in the PVD1 of thin films deposition on semiconductor chips. Because further miniaturization and multi-layering in cutting-edge semiconductors have progressed in the coming years, demand for thin film deposition - solutions via not only PVD but also the CVD and ALD2 approaches will likely grow. CVD･ALD Material Business Promotion Office will handle the entire scope of CVD and ALD materials for next-generation semiconductors, covering everything from efforts to identify development themes to mass-production in an integrated fashion, and work to accelerate the commercialization process. 　 1. PVD: Physical Vapor Deposition; the sputtering method is a common PVD process. 2. CVD: Chemical Vapor Deposition, which involves forming a thin film via a chemical reaction.　 ALD: Atomic Layer Deposition, which involves controlling film thickness at the atomic level in forming a thin film. See this news release in PDF format. (PDF : 461.2 KB) News Release TOP Menu Contact Us Search Sitemap Page Up Corporate Overview Message from the Management Philosophy Quick Guide to JX Advanced Metals Business Segments Corporate Data Organization and Executive Officers Corporate History Operating Sites and Group Companies Long-Term Vision and Medium- to Long-term Business Strategies and Business Targets Purchasing Information Products and Services Search by Category Search by Keyword Research and Development Our Core Technologies Contributing to Societal Growth and Innovation Initiatives for Co-creation Collaboration in the Group SQUARE LAB Sustainability Sustainability Report Toward Net-Zero CO2 Emissions Activities in Environmental Conservation CSR Purchasing News News Release Trade Fairs and Exhibitions Close Page Up Corporate Overview Products and Services Research and Development Sustainability News Privacy Policy Terms of Use Sitemap COOKIE 設定 Copyright © JX Advanced Metals Corporation All Rights Reserved.